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[IEEE 2009 International Workshop on Junction Technology (IWJT) - Kyoto, Japan (2009.06.11-2009.06.12)] 2009 International Workshop on Junction Technology - Junction anneal sequence optimization for advanced high-k / metal gate CMOS technology
Ortolland, C., Ragnarsson, L.-A., Kerner, C., Chiarella, T., Rosseel, E., Okuno, Y., Favia, P., Richard, O., Everaert, J.-L., Schram, T., Kubicek, S., Absil, P.P., Biesemans, S., Schreutelkamp, R., HoYear:
2009
Language:
english
DOI:
10.1109/iwjt.2009.5166219
File:
PDF, 534 KB
english, 2009