Depth profiling of boron in ultra-shallow junction devices...

Depth profiling of boron in ultra-shallow junction devices using time-of-flight neutron depth profiling (TOF-NDP)

Sacit M. Çetiner, Kenan Ünlü
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Volume:
579
Year:
2007
Language:
english
Pages:
5
DOI:
10.1016/j.nima.2007.04.027
File:
PDF, 157 KB
english, 2007
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