[IEEE Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Honolulu, HI, USA (2004.06.17-2004.06.17)] Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Novel fabrication process to realize ultra-thin (EOT = 0.7nm) and ultra-low leakage SiON gate dielectrics

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