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[IEEE 2006 Thirty-First IEEE/CPMT International Electronics Manufacturing Technology Symposium - Petaling Jaya, Malaysia (2007.11.8-2007.11.10)] 2006 Thirty-First IEEE/CPMT International Electronics Manufacturing Technology Symposium - Contact Hole Process Printability Beyond 180nm On Binary Mask
Shun, Cheong Yew, Sang, Ko Bong, Manaf, Mohd Jeffery Bin, Ibrahim, Kader, Jamal, Zul Azhar ZahidYear:
2006
Language:
english
DOI:
10.1109/iemt.2006.4456490
File:
PDF, 3.98 MB
english, 2006