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[IEEE 2006 International Electron Devices Meeting - San Francisco, CA, USA (2006.12.11-2006.12.13)] 2006 International Electron Devices Meeting - High Temperature Stable [Ir3Si-TaN]/HfLaON CMOS with Large Work-Function Difference
Wu, C. H., Hung, B. F., Chin, Albert, Wang, S. J., Chen, W. J., Wang, X. P., Li, M.-F., Zhu, C., Jin, Y., Tao, H. J., Chen, S. C., Liang, M. S.Year:
2006
Language:
english
DOI:
10.1109/iedm.2006.346859
File:
PDF, 411 KB
english, 2006