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Generation of Solid-Source H 2 O Plasma and Its Application to Dry Etching of CaF 2
Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, FumioVolume:
47
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.47.5113
Date:
June, 2008
File:
PDF, 252 KB
english, 2008