Generation of Solid-Source H 2...

Japanese Journal of Applied Physics 2008 / 6 Vol. 47; Iss. 6

Generation of Solid-Source H 2 O Plasma and Its Application to Dry Etching of CaF 2

Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, Fumio
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
47
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.47.5113
Date:
June, 2008
File:
PDF, 252 KB
english, 2008
Conversion to is in progress
Conversion to is failed