In-situ metrology for the optimization of bent crystals...

In-situ metrology for the optimization of bent crystals used in hard-X-ray monochromators: Comparison between measurement and simulation

Muriel Thomasset, Thierry Moreno, Blandine Capitanio, Mourad Idir, Samuel Bucourt
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Volume:
616
Year:
2010
Language:
english
Pages:
6
DOI:
10.1016/j.nima.2009.12.034
File:
PDF, 957 KB
english, 2010
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