[IEEE 1997 IEEE Hong Kong Electron Devices Meeting - Hong...

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[IEEE 1997 IEEE Hong Kong Electron Devices Meeting - Hong Kong (30 Aug. 1997)] 1997 IEEE Hong Kong Proceedings Electron Devices Meeting - n/sup +//p ultra-shallow junction formation with plasma immersion ion implantation

Yang, B.L., Jones, E.C., Cheung, N.W., Jiqun Shao,, Wong, H., Cheng, Y.C.
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Year:
1997
Language:
english
DOI:
10.1109/hkedm.1997.642287
File:
PDF, 328 KB
english, 1997
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