Run-by-Run Process Control of Metal Sputter Deposition:...

IEEE Transactions on Semiconductor Manufacturing 2007 / 08 Vol. 20; Iss. 3

Run-by-Run Process Control of Metal Sputter Deposition: Combining Time Series and Extended Kalman Filter

Chen, Juhn-Horng, Kuo, Tzu-Wei, Lee, An-Chen
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Volume:
20
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/tsm.2007.901392
Date:
August, 2007
File:
PDF, 510 KB
english, 2007
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