Transient enhanced diffusion and deactivation of...

Transient enhanced diffusion and deactivation of ion-implanted As in strained Si

G.D.M. Dilliway, A.J. Smith, J.J. Hamilton, J. Benson, Lu Xu, P.J. McNally, G. Cooke, H. Kheyrandish, N.E.B. Cowern
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Volume:
237
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.nimb.2005.04.114
File:
PDF, 151 KB
english, 2005
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