Strain relaxation of pseudomorphic...

Strain relaxation of pseudomorphic Si1−xGex/Si(1 0 0) heterostructures by Si+ ion implantation

B. Holländer, D. Buca, St. Lenk, S. Mantl, H.-J. Herzog, Th. Hackbarth, R. Loo, M. Caymax, M.J. Mörschbächer, P.F.P. Fichtner
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Volume:
242
Year:
2006
Language:
english
Pages:
4
DOI:
10.1016/j.nimb.2005.08.071
File:
PDF, 184 KB
english, 2006
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