Study of hydrogen stability in low-k dielectric films by...

Study of hydrogen stability in low-k dielectric films by ion beam techniques

Y. Zhang, L. Saraf, V. Shutthanandan, K.D. Hughes, R. Kuan, S. Thevuthasan
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Volume:
249
Year:
2006
Language:
english
Pages:
4
DOI:
10.1016/j.nimb.2006.04.022
File:
PDF, 232 KB
english, 2006
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