Potential sputtering from a Si surface by very highly...

Potential sputtering from a Si surface by very highly charged ion impact

Masahide Tona, Hirofumi Watanabe, Satoshi Takahashi, Nobuyuki Nakamura, Nobuo Yoshiyasu, Makoto Sakurai, Chikashi Yamada, Shunsuke Ohtani
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Volume:
258
Year:
2007
Language:
english
Pages:
4
DOI:
10.1016/j.nimb.2006.12.177
File:
PDF, 205 KB
english, 2007
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