Development of an MeV ion beam lithography system in...

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 2007 Vol. 260; Iss. 1

Development of an MeV ion beam lithography system in Jyväskylä

Sergey Gorelick, Tommi Ylimäki, Timo Sajavaara, Mikko Laitinen, A. Sagari A.R., Harry J. Whitlow
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Volume:
260
Year:
2007
Language:
english
Pages:
4
DOI:
10.1016/j.nimb.2007.01.260
File:
PDF, 429 KB
english, 2007
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