Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
2007 Vol. 260; Iss. 1
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Hydrogen silsesquioxane a next generation resist for proton beam writing at the 20 nm level
J.A. van Kan, A.A. Bettiol, F. WattVolume:
260
Year:
2007
Language:
english
Pages:
4
DOI:
10.1016/j.nimb.2007.02.051
File:
PDF, 423 KB
english, 2007