[IEEE 2008 International Conference on Advanced Semiconductor Devices and Microsystems (ASDAM) - Smolenice, Slovakia (2008.10.12-2008.10.16)] 2008 International Conference on Advanced Semiconductor Devices and Microsystems - New progressive method suitable for the exposure optimization of large and complex defect-free chips direct written by ZBA 21 e-beam tool
Matay, Ladislav, Andok, Robert, Barak, Vladislav, Konecnikova, Anna, Kostic, Ivan, Partel, Stefan, Hudek, PeterYear:
2008
Language:
english
DOI:
10.1109/asdam.2008.4743316
File:
PDF, 1.61 MB
english, 2008