Dose-dependent thermal oxidation of Ge+-implanted silicon

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 2007 Vol. 261; Iss. 1-2

Dose-dependent thermal oxidation of Ge+-implanted silicon

Khalid Hossain, O.W. Holland, F.U. Naab, L.J. Mitchell, P.R. Poudel, J.L. Duggan, F.D. McDaniel
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Volume:
261
Year:
2007
Language:
english
Pages:
4
DOI:
10.1016/j.nimb.2007.04.240
File:
PDF, 204 KB
english, 2007
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