[IEEE 2006 International Workshop on Junction Technology - Shanghai, China ()] 2006 International Workshop on Junction Technology - Self-Amorphizing Gas Cluster Ion Beam Technology and Combination with Laser Spike Anneal for Highly Scaled Source Drain Junction
Ho Lee,, Hwa Sung Rhee,, Ueno, T., Myung Sun Kim,, Ji Hye Yi,, Cho, H.S., Youngsu Chung,, Seulgi Kim,, Hion Suck Baik,, Feng, L., Yun Wang,, Hautala, J., Skinner, W., Geum-Jong Bae,, Nae-In LYear:
2006
Language:
english
DOI:
10.1109/iwjt.2006.220857
File:
PDF, 3.49 MB
english, 2006