Ion beam characterization of rf-sputter deposited AlN films...

Ion beam characterization of rf-sputter deposited AlN films on Si(1 1 1)

N. Matsunami, S. Venkatachalam, M. Tazawa, H. Kakiuchida, M. Sataka
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Volume:
266
Year:
2008
Language:
english
Pages:
5
DOI:
10.1016/j.nimb.2007.12.086
File:
PDF, 387 KB
english, 2008
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