[IEEE 2010 11th IEEE International Workshop on Advanced...

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[IEEE 2010 11th IEEE International Workshop on Advanced Motion Control (AMC) - Nagaoka, Japan (2010.03.21-2010.03.24)] 2010 11th IEEE International Workshop on Advanced Motion Control (AMC) - Passivity-based contour following control design with virtual plant disturbance compensation

Chen, Chao-Yun, Cheng, Ming-Yang, Wu, Jen-Che, Su, Ke-Han
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Year:
2010
Language:
english
DOI:
10.1109/amc.2010.5464041
File:
PDF, 1.16 MB
english, 2010
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