The interdiffusion and solid-state reaction of low-energy...

The interdiffusion and solid-state reaction of low-energy copper ions implanted in silicon

Xing-Xin Gao, Tian-Jing Li, Gong-Ping Li, Bo Cao
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Volume:
266
Year:
2008
Language:
english
Pages:
4
DOI:
10.1016/j.nimb.2008.03.082
File:
PDF, 286 KB
english, 2008
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