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[IEEE 2000 International Conference on Simulation of Semiconductor Processes and Devices - Seattle, WA, USA (6-8 Sept. 2000)] 2000 International Conference on Simulation Semiconductor Processes and Devices (Cat. No.00TH8502) - Characteristics of silicon nano-scale devices

Hiramoto, T., Majima, H.
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Year:
2000
Language:
english
DOI:
10.1109/sispad.2000.871237
File:
PDF, 455 KB
english, 2000
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