[Japan Soc. Appl. Phys 1999 Symposium on VLSI Technology....

Main
[Japan Soc. Appl. Phys 1999 Symposium...

[Japan Soc. Appl. Phys 1999 Symposium on VLSI Technology. Digest of Technical Papers - Kyoto, Japan (14-16 June 1999)] 1999 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.99CH36325) - Sub-quarter micron CMOS process for TiN-gate MOSFETs with TiO/sub 2/ gate dielectric formed by titanium oxidation

Hobbs, C., Hegde, R., Maiti, B., Tseng, H., Gilmer, D., Tobin, P., Adetutu, O., Huang, F., Weddington, D., Nagabushnam, R., O'Meara, D., Reid, K., La, L., Grove, L., Rossow, M.

How much do you like this book?

What’s the quality of the file?

Download the book for quality assessment

What’s the quality of the downloaded files?

Year:

1999

Language:

english

DOI:

10.1109/vlsit.1999.799379

File:

PDF, 191 KB

english, 1999

Conversion to is in progress

Conversion to is failed