Study of defects in implanted silica glass by depth...

Study of defects in implanted silica glass by depth profiling Positron Annihilation Spectroscopy

R.S. Brusa, S. Mariazzi, L. Ravelli, P. Mazzoldi, G. Mattei, W. Egger, C. Hugenschmidt, B. Löwe, P. Pikart, C. Macchi, A. Somoza
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Volume:
268
Year:
2010
Language:
english
Pages:
5
DOI:
10.1016/j.nimb.2010.05.084
File:
PDF, 716 KB
english, 2010
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