in situ Phosphorus-Doped Silicon Film...

Japanese Journal of Applied Physics 1985 / 4 Vol. 24; Iss. Part 2, No

in situ Phosphorus-Doped Silicon Film Depositions by Magnetron Sputtering in Phosphorus Vapor

Okamoto, Akio, Serikawa, Tadashi
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Volume:
24
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.24.l247
Date:
April, 1985
File:
PDF, 325 KB
1985
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