[IEEE 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 - Kyoto, Japan (22-26 June 1998)] 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) - Suppression of abnormal oxidation of WSi/sub x//P-doped Si stack gate electrode during gate re-oxidation by additional nitrogen ion implantation

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