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Improving feature size uniformity from interference lithography systems with non-uniform intensity profiles
Chang, En-Chiang, Mikolas, David, Lin, Pao-Te, Schenk, Tony, Wu, Chien-Li, Sung, Cheng-Kuo, Fu, Chien-ChungVolume:
24
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/24/45/455301
Date:
November, 2013
File:
PDF, 2.07 MB
english, 2013