![](/img/cover-not-exists.png)
[IEEE International Symposium on VLSI Technology, Systems and Applications - Taipei, Taiwan (17-19 May 1989)] International Symposium on VLSI Technology, Systems and Applications - A low temperature 12 ns DRAM
Henkels, W.H., Lu, N.C.C., Hwang, W., Rajeevakumar, T.V., Franch, R.L., Jenkins, K.A., Bucelot, T.J., Heidel, D.F., Immediato, M.J.Year:
1989
Language:
english
DOI:
10.1109/vtsa.1989.68576
File:
PDF, 442 KB
english, 1989