[Japan Soc. Appl. Phys 1999 Symposium on VLSI Technology. Digest of Technical Papers - Kyoto, Japan (14-16 June 1999)] 1999 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.99CH36325) - Improvement of CoSi/sub 2/ stability on fine grain sized poly-Si using nitrogen implantation through Co monosilicide and its effect on 0.18 μm dual gate CMOS

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