Formation of Uniform Solid-Phase Epitaxial CoSi...

Japanese Journal of Applied Physics 1985 / 8 Vol. 24; Iss. Part 1, No

Formation of Uniform Solid-Phase Epitaxial CoSi 2 Films by Patterning Method

Ishibashi, Kouichirou, Furukawa, Seijiro
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Volume:
24
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.24.912
Date:
August, 1985
File:
PDF, 1.62 MB
1985
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