Preparation of Highly Porous Silica Aerogel Thin Film by...

Japanese Journal of Applied Physics 2000 / 3 Vol. 39; Iss. Part 2, No

Preparation of Highly Porous Silica Aerogel Thin Film by Supercritical Drying

Kawakami, Nobuyuki, Fukumoto, Yoshito, Kinoshita, Takashi, Suzuki, Kohei, Inoue, Ken-ichi
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Volume:
39
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.39.l182
Date:
March, 2000
File:
PDF, 271 KB
english, 2000
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