Negative Bias Temperature Instability on Plasma-Nitrided...

Japanese Journal of Applied Physics 2002 / 3 Vol. 41; Iss. Part 2, No

Negative Bias Temperature Instability on Plasma-Nitrided Silicon Dioxide Film

Ang, Chew-Hoe, Lek, Chun-Meng, Tan, Shyue-Seng, Cho, Byung-Jin, Chen, Tupei, Lin, Wenhe, Zhen, Jia-Zheng
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
41
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.41.l314
Date:
March, 2002
File:
PDF, 77 KB
english, 2002
Conversion to is in progress
Conversion to is failed