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Negative Bias Temperature Instability on Plasma-Nitrided Silicon Dioxide Film
Ang, Chew-Hoe, Lek, Chun-Meng, Tan, Shyue-Seng, Cho, Byung-Jin, Chen, Tupei, Lin, Wenhe, Zhen, Jia-ZhengVolume:
41
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.41.l314
Date:
March, 2002
File:
PDF, 77 KB
english, 2002