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[IEEE 2014 7th International Silicon-Germanium Technology and Device Meeting (ISTDM) - Singapore, Singapore (2014.6.2-2014.6.4)] 2014 7th International Silicon-Germanium Technology and Device Meeting (ISTDM) - Observation of in situ B-doped Epitaxial Ge layer growth on Si(111) by ultra-high vacuum chemical vapor deposition
Kim, Byongju, Jang, Hyunchul, Byeon, Dae-Seop, Koo, Sangmo, Ko, Dae-HongYear:
2014
Language:
english
DOI:
10.1109/istdm.2014.6874662
File:
PDF, 3.56 MB
english, 2014