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Ten-Nanometer Resolution Nanolithography using Newly Developed 50-kV Electron Beam Direct Writing System
Ochiai, Yukinori, Baba, Masakazu, Watanabe, Heiji, Matsui, ShinjiVolume:
30
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.30.3266
Date:
November, 1991
File:
PDF, 2.15 MB
1991