[IEEE 2006 International Symposium on Semiconductor Manufacturing (ISSM) - Tokyo, Japan (2006.09.25-2006.09.27)] 2006 IEEE International Symposium on Semiconductor Manufacturing - Electrical Defect Density Test Structures for DFM in the Sub-wavelength Lithography Regime with Copper Metallization
Segal, Julie, Nagatani, Go, Tabery, CyrusYear:
2006
Language:
english
DOI:
10.1109/ISSM.2006.4493012
File:
PDF, 1.69 MB
english, 2006