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[RTP 9th International Conference on Advanced Thermal Processing of Semiconductors. RTP 2001 - Anchorage, AK, USA (25-29 Sept. 2001)] 9th International Conference on Advanced Thermal Processing of Semiconductors, RTP 2001 - Optimal heating control conditions to unify temperature distribution in a wafer during rapid thermal processing with lamp heaters
Hirasawa, S., Suzuki, T., Maruyama, S.Year:
2001
Language:
english
DOI:
10.1109/rtp.2001.1013768
File:
PDF, 608 KB
english, 2001