[IEEE 2008 16th International Conference on Advanced Thermal Processing of Semiconductors (RTP) - Las Vegas, NV, USA (2008.09.30-2008.10.3)] 2008 16th IEEE International Conference on Advanced Thermal Processing of Semiconductors - Enhancing tensile stress and source/drain activation with Si:C with innovations in ion implant and millisecond laser spike annealing
Maynard, Helen, Hatem, Christopher, Gossmann, Hans-Joachim, Erokhin, Yuri, Variam, Naushad, Shaoyin Chen,, Yun Wang,Year:
2008
Language:
english
DOI:
10.1109/rtp.2008.4690549
File:
PDF, 9.99 MB
english, 2008