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[IEEE 2011 22nd Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2011.05.16-2011.05.18)] 2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference - Optimization of pitch-split double patterning phoresist for applications at the 16nm node
Holmes, Steven J., Tang, Cherry, Burns, Sean, Yin, Yunpeng, Chen, Rex, Koay, Chiew-seng, Kini, Sumanth, Tomizawa, Hideyuki, Chen, Shyng-Tsong, Fender, Nicolette, Osborn, Brian, Singh, Lovejeet, PetrilYear:
2011
Language:
english
DOI:
10.1109/asmc.2011.5898203
File:
PDF, 1.95 MB
english, 2011