Plasma Deposition, Properties and Structure of Amorphous...

Materials Science Forum 1990 Vol. 52-53

Plasma Deposition, Properties and Structure of Amorphous Hydrogenated Carbon Films

Koidl, P., Wild, Ch., Dischler, B., Wagner, J., Ramsteiner, M.
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Volume:
52-53
Year:
1990
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/msf.52-53.41
File:
PDF, 1.25 MB
english, 1990
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