[IEEE 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 - Kyoto, Japan (22-26 June 1998)] 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) - Implantation of nitrogen into polysilicon to suppress boron penetration through the gate oxide
Bauer, A.J., Mayer, P., Frey, L., Haublein, V., Ryssel, H.Volume:
1
Year:
1998
Language:
english
DOI:
10.1109/iit.1999.812044
File:
PDF, 352 KB
english, 1998