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[IEEE 2007 International Symposium on Semiconductor Manufacturing - Santa Clara, CA, USA (2007.10.15-2007.10.17)] 2007 International Symposium on Semiconductor Manufacturing - Low temperature MOCVD TiN process for 45nm contact metallization
Hua Ai,, Jackson, Michael, Sang Ho Yu,Year:
2007
Language:
english
DOI:
10.1109/issm.2007.4446860
File:
PDF, 1.42 MB
english, 2007