GROWTH TEMPERATURE DEPENDENCE OF Ga 2 O 3 THIN FILMS DEPOSITED BY PLASMA ENHANCED ATOMIC LAYER DEPOSITION
LIU, G. X., SHAN, F. K., LEE, W. J., SHIN, B. C., KIM, S. C., KIM, H. S., CHO, C. R.Volume:
94
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584580701755716
Date:
December, 2007
File:
PDF, 570 KB
english, 2007