![](/img/cover-not-exists.png)
[IEEE IEEE 29th International Conference on Plasma Sciences - Banff, Alta., Canada (26-30 May 2002)] IEEE Conference Record - Abstracts. 2002 IEEE International Conference on Plasma Science (Cat. No.02CH37340) - Resist plasma etching for 157 nm lithography
Eon, D., Cartry, G., Peignon, M.C., Cardinaud, Ch., Tserepi, A., Cordoyiannis, G., Valamontes, E.S., Raptis, I., Gogolides, E.Year:
2002
Language:
english
DOI:
10.1109/plasma.2002.1030463
File:
PDF, 75 KB
english, 2002