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[IEEE 2009 IEEE International Interconnect Technology Conference - IITC - Sapporo, Japan (2009.06.1-2009.06.3)] 2009 IEEE International Interconnect Technology Conference - Thin low-k SiOC(N) dielectric / ruthenium stacked barrier technology
Tarumi, Nobuaki, Oda, Noriaki, Kondo, Seiichi, Ogawa, ShinichiYear:
2009
Language:
english
DOI:
10.1109/iitc.2009.5090388
File:
PDF, 1.57 MB
english, 2009