[IEEE 2010 21st Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - San Francisco, CA, USA (2010.07.11-2010.07.13)] 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Voltage contrast test structure for measurement of mask misalignment
Patterson, Oliver D., Hahn, Roland, Fox, Stephen R.Year:
2010
Language:
english
DOI:
10.1109/asmc.2010.5551479
File:
PDF, 434 KB
english, 2010