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[IEEE 2007 IEEE International Electron Devices Meeting - Washington, DC, USA (2007.12.10-2007.12.12)] 2007 IEEE International Electron Devices Meeting - Single Metal/Dual High-k Gate Stack with Low Vth and Precise Gate Profile Control for Highly Manufacturable Aggressively Scaled CMISFETs
Mise, N., Morooka, T., Eimori, T., Kamiyama, S., Murayama, K., Sato, M., Ono, T., Nara, Y., Ohji, Y.Year:
2007
Language:
english
DOI:
10.1109/iedm.2007.4418991
File:
PDF, 3.51 MB
english, 2007