Al2O3/HfO2 functional stack films based resistive switching...

Solid State Ionics 2015 / 05 Vol. 273

Al2O3/HfO2 functional stack films based resistive switching memories with controlled SET and RESET voltages

Chen, Lin, Dai, Ya-Wei, Sun, Qing-Qing, Guo, Jiao-Jiao, Zhou, Peng, Zhang, David Wei
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Volume:
273
Language:
english
Journal:
Solid State Ionics
DOI:
10.1016/j.ssi.2014.08.014
Date:
May, 2015
File:
PDF, 1.37 MB
english, 2015
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