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[IEEE 2008 International Workshop on Junction Technology (IWJT) - Shanghai, China (2008.05.15-2008.05.16)] Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08) - COO reduction on polysilicon gate doping by beam current increase on batch-type implanters
Hisaki Izutani,, Yuji Takahashi,, Mitsuaki Harada,Year:
2008
Language:
english
DOI:
10.1109/iwjt.2008.4540011
File:
PDF, 68 KB
english, 2008