Sputtering of Si with keV Ar + Ions. II. Computer Simulation of Sputter Broadening Due to Ion Bombardment in Depth Profiling
Kang, Suk Tai, Shimizu, Ryuichi, Okutani, TsuyoshiVolume:
18
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.18.1987
Date:
October, 1979
File:
PDF, 956 KB
1979