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[IEEE 2008 International Workshop on Junction Technology (IWJT) - Shanghai, China (2008.05.15-2008.05.16)] Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08) - Profiling of carrier properties for shallow junctions using a new sub-nanometer step-by-step etching technique
Kazuo Tsutsui,, Masamitsu Watanabe,, Yasumasa Nakagawa,, Kazunori Sakai,, Takayuki Kai,, Cheng-Guo Jin,, Yuichiro Sasaki,, Kuniyuki Kakushima,, Ahmet, Parhat, Bunji Mizuno,, Takeo Hattori,,Year:
2008
Language:
english
DOI:
10.1109/iwjt.2008.4540018
File:
PDF, 110 KB
english, 2008